Journal

Materials Science in Semiconductor Processing

ISSN 1369-8001 · Elsevier BV

Published here

2 counted works of 2 linked

YearTitleAcademicsSources
2006 E-MRS Symposium L: Characterization of high-k dielectric materials Kosuke Imai GS
2006 Performance improvement of CMOS device utilizing poly-Si/HfSiON gate stack and its reliability concern for 65 nm technology and beyond Kosuke Imai GS